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Dust-free wipe paper technology analysis and performance standard system
1. Clean Guardian in the Field of Precision Manufacturing: Core Characteristic Analysis Dust-free Wipe Paper As the core consumable for precision manufacturing, its particle control ability is directly related to the product yield. In the semiconductor wafer processing stage, this type of professional cleaning material needs to control the number of particles above 0.3 μm to within 5 per square centimeter. The dust-free wipe paper made of microfiber braiding technology can have a fiber shedding amount as low as 0.025 mg per square meter, which is equivalent to keeping the surface clean for 30 consecutive use in a thousand-level clean room environment. Taking the medical catheter assembly workshop as an example, the 0609 double-layer composite structure product can simultaneously complete the dual tasks of electrostatic removal and isopropanol residue removal of the instrument surface, and its cleanliness performance is better than the ISO 14644-1 Class 5 standard.
2. Gold formula for material engineering: composite structure innovation achieves synergistic efficiency of material performance through the precise ratio of 45% plasma modified polyester and 55% nano-scale wood pulp. This innovative combination is like the protective net of precision instruments: the surface-etched polyester fibers form honeycomb-like micropores, and the tensile strength is increased to 20N/5cm, and the structure remains stable when repeatedly wiping the indium tin oxide coating on the liquid crystal screen. After the wood pulp component is ultrasonic fiber-opened, the fiber diameter is reduced to below 3 μm, and the retention efficiency of photoresist particles is increased to 95%. The three-dimensional network structure constructed by hot air bonding technology makes the interlayer bonding strength reach 1.3 times that of conventional products.
3. Scientific basis for grading application: The standard product of gram weight parameter system (56-60g/㎡) can effectively remove diamond wire cutting residues on the surface of the silicon wafer in the photovoltaic panel production line. When applied to PCB drilling process, the enhanced product (61-68g/㎡) exhibits 3.5 times the self-weight absorption capacity, effectively controlling the diffusion of drilling and dirt. The actual data from the automotive coating workshop shows that the use of 68g grade wipe material can reduce the defect rate of paint surface particles to 0.8PPM, while reducing solvent consumption by 22%.
4. Performance verification in harsh environments: The quantitative quality benchmark has been verified by the National Institute of Metrology, and the key product indicators exceed industry standards: the longitudinal tensile strength reaches 15N/5cm, meeting the wipe strength requirements of the 300mm wafer handling robot arm. In the biosafety cabinet test, the liquid absorption rate was shortened to 2.8 seconds, and combined with the gamma ray sterilization process, it became the first choice consumable for vaccine filling lines. According to the IEST standard test, after 100 consecutive wipes, the release amount of 0.5μm particles is stable below 3 particles/cm², meeting the aerospace-level cleanliness requirements.
5. Cleanliness guarantee for the whole process: The production control system realizes particle monitoring throughout the entire process from raw material unpacking to finished product packaging in an ISO level 7 clean workshop with temperature fluctuation ±1℃ and humidity control ±3%RH. A vacuum suspension transmission system is adopted to ensure that the surface cleanliness of the product is maintained at level 10 standards. Medical device manufacturers reported that the wipe materials produced using this system can reduce the amount of endotoxin residue to 0.25 EU/cm², meeting the injection production specifications of the Chinese Pharmacopoeia. In high-precision clean scenarios such as semiconductor manufacturing, ISO Class 3 (level 10) clean environment puts strict requirements on the performance of consumables. The multi-layer composite dust-free wipe paper uses innovative edge hot melt sealing technology to accurately control the particle release amount within the threshold of 0.1mg/m³, which is equivalent to one thousandth of the dust concentration in ordinary office environments. This precision structure is like a molecular sieve filtration system, effectively intercepting particulate matter with a diameter of more than 0.3μm, and is particularly suitable for ultra-clean processes such as wafer surface treatment.
The standardized packaging system adopts a three-layer protective design: a food-grade PE film vacuum sealing layer, a conductive antistatic intermediate layer, and a high-strength outer protective layer. Taking the 0609 model dust-free paper as an example, its roll specification adopts an ergonomic design of 500 pieces/roll configuration, and is combined with a 99.99% nitrogen packaging process to ensure that the cleanliness of the product is stable to maintain the ISO Class 5 standard during transportation and storage. This packaging solution was confirmed to reduce the risk of unboxing pollution by 83% in Samsung Electronics' 2022 supplier review.
Industrial cleaning chromatography systems follow global standardization trends. White dust-free wipes occupy 78% of the market share in the chip manufacturing field, and their high contrast characteristics can instantly show 0.5μm-level microparticle residues. Test data from Toyota Motor Research Institute in 2023 shows that in the cleaning of engine parts of blue products, the sensitivity of oil stain recognition is 40% higher than that of traditional white products. It is worth noting that the EU EN 1829 standard stipulates the blue-green system as an industrial safety color, which directly leads to a penetration rate of this color system in the European automobile manufacturing industry reaching 92%.
The quality verification system needs to build a triple guarantee mechanism: first, the supplier is required to provide a complete RoHS 2.0 certification document to ensure that the content of heavy metals such as lead and cadmium is less than the 100ppm limit; second, the ISO 14644-1 clean room compatibility certificate is required, which requires no more than 200 fibers per square meter; finally, the TDS technical parameter table should be reviewed, focusing on the ion precipitation amount (needed to<0.01μg/cm²) and the surface resistance value (it should be controlled in the 10^6-10^9Ω range). The world's leading suppliers such as 3M and NTT Advanced Technology, their products have all passed the IEST-STD-CC1246D Level 4 Cleansing Certification in the United States, and this standard has been included in the basic conditions for supplier access by TSMC.
Precision cleaning operation specifications in the field of electronic manufacturing In the semiconductor manufacturing process, the precision circuit board cleaning process requires the use of 99.9% high-purity isopropanol (IPA) solvent combined with special dust-free wipe paper. Engineering practice shows that when operating with a "Z-shaped" one-way wipe method similar to calligraphy brushwork, each wipe area should be controlled within 15cm². The 2023 quality report of an international semiconductor company shows that this standardized operation has reduced the incidence of secondary pollution of products from 0.15% to 0.015%, which is equivalent to reducing the pollution risk coefficient to one-tenth of the original value.
Analysis of key technologies for surface treatment of optical devices. For the maintenance of precision optical coating devices, it is recommended to use a three-layer composite structure blue microfiber laminated dust-free wipe paper. This professional consumable, designed with a 0.3μm fiber diameter, has a surface structure similar to nano-scale velvet, which can effectively eliminate micro-scale scratches caused by traditional wipe materials. In actual operation, the principle of double protection must be followed: operators must wear anti-static bracelets woven with conductive fibers and use ionic wind dust removal equipment. Comparative test data from a national optical laboratory showed that the combined solution increased the surface integrity of the optical component to 99.8%.
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